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28 February 2006 Femtosecond laser processing of subwavelength-sized voids for compact optical devices
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We have demonstrated femtosecond laser fabrication of submicrometer-sized voids in fused silica. Femtosecond laser pulses of 100 fs were focused into fused silica with a 0.9 numerical aperture (NA) objective lens under various incident conditions. The void shape is linearly drawn in the direction of the laser irradiation, when a single pulse is irradiated. The irradiation of multiple pulses induces multiple spherical voids which make a void array. The void shape also depended on the depth of the focus point beneath the fused silica surface, because the amount of self-focusing has a significant effect on the generation of the voids. The void shape was narrower and longer when the laser pulse was focused into the deeper position (up to 70 μm) in the sample. In addition, a 90 degree bend waveguide was fabricated in combination with a void array reflector. Since both reflector and optical waveguides were fabricated by femtosecond laser only, this technique would be useful to develop 3-dimensional optical devices.
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Eiji Toratani, Masanao Kamata, Nikolay N. Nedyalkov, and Minoru Obara "Femtosecond laser processing of subwavelength-sized voids for compact optical devices", Proc. SPIE 6108, Commercial and Biomedical Applications of Ultrafast Lasers VI, 610815 (28 February 2006);

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