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23 January 2006 Microstereolithography production of integrated Hadamard mask structures
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Abstract
The use of modern microstreolithography (MSL) technology gives optics developers the freedom to integrate mounting and positioning structures directly into an optical mask structure. We have created Hadamard spectrometer masks with increments of 150 μm and less using the Sony SCS-6000 microstereolithography apparatus (MSLA). Due to laser over cure and other parameters, adjustments were made iteration by iteration until appropriate mask tolerances were met. A mounting structure was integrated with the mask for testing and application. At the computer aided design (CAD) model level, the mounting geometry can be adjusted to fit any specific mounting apparatus. By using the MSLA, features as small as 75 μm and larger than 300 mm can be created in the same build. Additionally, the conceptual design of an entire positioning system constructed using layer additive MSLA microfabrication is underway. This positioning system may be built as an integrated assembly, encapsulating necessary components. Optical characterization results are presented.
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Christopher J. Robinson, Larinn M. Southwell, Jeremy A. Palmer, Mark W. Smith, Michael B. Sinclair, Bart D. Chavez, Brent E. Stucker, Francisco Medina, and Ryan B. Wicker "Microstereolithography production of integrated Hadamard mask structures", Proc. SPIE 6109, Micromachining and Microfabrication Process Technology XI, 61090B (23 January 2006); https://doi.org/10.1117/12.646417
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