Paper
23 January 2006 Tolerancing microlenses using ZEMAX
Author Affiliations +
Abstract
This paper demonstrates a new tolerancing technique that allows the prediction of microlens optical performance based on metrology measurements taken during the fabrication process. A method for tolerancing microlenses to ensure operating performance using the optical design code ZEMAX(R) is presented. Parameters able to be measured by available metrology tools are assigned tolerances. The goal of the tolerance analysis is to assess the sensitivity of a microlens design to changes in the shape of the lens surface with regard to specific optical performance criteria related to the intended application. Two designs are presented with the tolerance analysis results. In the first design, the radius of curvature and conic constant are varied for an aspheric lens, and the change in the spot size is determined. For the second design, fiber-coupling efficiency is tabulated for a biconic lens. In each case, a metric can be produced showing the ability of the design to meet performance goals within the specified tolerances. A fabrication technician can then use this tolerancing metric with appropriate metrology data to determine if the device will yield acceptable performance. The metric can also determine if a design is overly sensitive to expected tolerances, thereby allowing the optical designer to evaluate the design from a manufacturing perspective.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andrew Stockham and John G. Smith "Tolerancing microlenses using ZEMAX", Proc. SPIE 6110, Micromachining Technology for Micro-Optics and Nano-Optics IV, 61100U (23 January 2006); https://doi.org/10.1117/12.644894
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CITATIONS
Cited by 4 scholarly publications.
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KEYWORDS
Tolerancing

Microlens

Zemax

Etching

Semiconducting wafers

Optics manufacturing

Microlens array

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