Characterization of NLO polymer materials for optical waveguide structures

Perry P. Yaney; Emily M. Heckman; Antonio Davis; Joshua A. Hagen; Carrie M. Bartsch; Guru Subramanyam; James G. Grote; F. Kenneth Hopkins

doi:10.1117/12.646398

23 February 2006 Characterization of NLO polymer materials for optical waveguide structures

Perry P. Yaney, Emily M. Heckman, Antonio Davis, Joshua A. Hagen, Carrie M. Bartsch, Guru Subramanyam, James G. Grote, F. Kenneth Hopkins

Author Affiliations +

Proceedings Volume 6117, Organic Photonic Materials and Devices VIII; 61170W (2006) https://doi.org/10.1117/12.646398
Event: Integrated Optoelectronic Devices 2006, 2006, San Jose, California, United States

Abstract

Polymers have a number of attributes that make them highly desirable for use in the design and fabrication of optical waveguide devices, such as modulators and directional couplers. They have relatively low (1.5-1.7) refractive indices, low (~4) dielectric constants at gigahertz frequencies, stable at high (150-190^oC) temperatures, resistivities that can be tailored by adding guest molecules and electro-optical responses via the addition of chromophore molecules. These materials are easily spin-coated on glass, quartz or silicon wafers to form optically conducting films that have low (1-2 dB/cm) optical loss at the near-IR communication wavelengths. In this paper we update resistivity, dielectric, electrooptic coefficient and waveguide loss characterization methods and improvements that we are using to provide the data needed to fabricate polymer waveguide devices and report new results for DNA-based polymers.

Citation Download Citation

Perry P. Yaney, Emily M. Heckman, Antonio Davis, Joshua A. Hagen, Carrie M. Bartsch, Guru Subramanyam, James G. Grote, and F. Kenneth Hopkins "Characterization of NLO polymer materials for optical waveguide structures", Proc. SPIE 6117, Organic Photonic Materials and Devices VIII, 61170W (23 February 2006); https://doi.org/10.1117/12.646398

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