Paper
3 March 2006 Deep UV AlGaN light emitting diodes grown by gas source molecular beam epitaxy on sapphire and AlGaN/sapphire substrates
S. Nikishin, B. Borisov, V. Kuryatkov, A. Usikov, V. Dmitriev, M. Holtz
Author Affiliations +
Abstract
We report the electrical and optical properties of deep ultraviolet light emitting diodes (LEDs) based on digital alloy structures (DAS) of AlN/Al0.08Ga0.92N grown by gas source molecular beam epitaxy with ammonia on sapphire substrates and AlGaN/sapphire templates. AlGaN/sapphire templates were grown by recently developed stress controlled hydride vapor phase epitaxy (HVPE). For DAS with effective bandgap of 5.1 eV we obtain room temperature electron concentrations up to 1x1019 cm-3 and hole concentrations of 1x1018 cm-3. Based on these results we prepared double heterostructure (DHS) LEDs operating in the range of 250 to 290 nm. The emission wavelengths were controlled through the effective bandgap of the active region. The possible ways for increase of LED's efficiency are discussed. We observed significant improvement in the room temperature luminescence efficiency (by factor of 100) of AlGaN quantum wells when a transition growth mode is induced by reduced flux of ammonia. We found that active layer grown on HVPE AlGaN/sapphire substrates have higher luminescence efficiency (by factor of 3) than DAS grown on sapphire.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. Nikishin, B. Borisov, V. Kuryatkov, A. Usikov, V. Dmitriev, and M. Holtz "Deep UV AlGaN light emitting diodes grown by gas source molecular beam epitaxy on sapphire and AlGaN/sapphire substrates", Proc. SPIE 6121, Gallium Nitride Materials and Devices, 61210T (3 March 2006); https://doi.org/10.1117/12.657921
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Cited by 5 scholarly publications.
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KEYWORDS
Light emitting diodes

Aluminum nitride

Gallium

Aluminum

Sapphire

Deep ultraviolet

Luminescence

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