24 February 2006 Multilayer integrated nano-optical devices
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Abstract
We report optical devices based on monolithic integration of multiple nano-structured optical functional layers. Ultraviolet (UV)-nanoimprint lithography along with thin-film deposition, high aspect-ratio reactive ion etching (RIE) and trench-filling technologies were used in fabrication and integration of individual nano-structured optical functional layers. Structures with sub-50 nm linewidth were required in order to achieve good optical performance in the near-UV and visible wavelengths. The ability to integrate multiple nanostructure-based optical layers opens a path for novel integrated optical devices, as well as a new strategy for driving both miniaturization and cost.
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Jian Wang, Jian Wang, Xuegong Deng, Xuegong Deng, Xiaoming Liu, Xiaoming Liu, Anguel Nikolov, Anguel Nikolov, Paul Sciortino, Paul Sciortino, Feng Liu, Feng Liu, Lei Chen, Lei Chen, } "Multilayer integrated nano-optical devices", Proc. SPIE 6123, Integrated Optics: Devices, Materials, and Technologies X, 61230P (24 February 2006); doi: 10.1117/12.646272; https://doi.org/10.1117/12.646272
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