24 February 2006 Multilayer integrated nano-optical devices
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We report optical devices based on monolithic integration of multiple nano-structured optical functional layers. Ultraviolet (UV)-nanoimprint lithography along with thin-film deposition, high aspect-ratio reactive ion etching (RIE) and trench-filling technologies were used in fabrication and integration of individual nano-structured optical functional layers. Structures with sub-50 nm linewidth were required in order to achieve good optical performance in the near-UV and visible wavelengths. The ability to integrate multiple nanostructure-based optical layers opens a path for novel integrated optical devices, as well as a new strategy for driving both miniaturization and cost.
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Jian Wang, Jian Wang, Xuegong Deng, Xuegong Deng, Xiaoming Liu, Xiaoming Liu, Anguel Nikolov, Anguel Nikolov, Paul Sciortino, Paul Sciortino, Feng Liu, Feng Liu, Lei Chen, Lei Chen, "Multilayer integrated nano-optical devices", Proc. SPIE 6123, Integrated Optics: Devices, Materials, and Technologies X, 61230P (24 February 2006); doi: 10.1117/12.646272; https://doi.org/10.1117/12.646272

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