Electrostatically tunable infrared filter that uses etched thin Si plates

Itsunari Yamada; Kazuya Kimura; Yutaka Yamagishi; Mitsunori Saito

doi:10.1117/12.647503

1 March 2006 Electrostatically tunable infrared filter that uses etched thin Si plates

Itsunari Yamada, Kazuya Kimura, Yutaka Yamagishi, Mitsunori Saito

Proceedings Volume 6125, Silicon Photonics; 61250Y (2006) https://doi.org/10.1117/12.647503
Event: Integrated Optoelectronic Devices 2006, 2006, San Jose, California, United States

Abstract

We fabricated infrared Fabry-Perot filters by stacking two wet-etched Si plates. When an electric voltage was applied between the plates, the spacing between the plates changed due to an electrostatic force, which caused a shift of interference peaks. The Si plates were etched in a KOH solution to 34-μm thickness in order to reduce the driving voltage. When the voltage was raised from 0 to 20 V, an interference peak shifted from 7.9- to 5.5-μm wavelength, corresponding to the decrease in the spacing from 7.9 to 5.5 μm. The peak transmittance increased to 91% by an antireflection coating on the outer surface of the filter. This coating was effective to suppress the interference inside the Si plates that created a complicated spectrum.

Citation Download Citation

Itsunari Yamada, Kazuya Kimura, Yutaka Yamagishi, and Mitsunori Saito "Electrostatically tunable infrared filter that uses etched thin Si plates", Proc. SPIE 6125, Silicon Photonics, 61250Y (1 March 2006); https://doi.org/10.1117/12.647503

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