Nanostructured semiconductors for optoelectronic applications

Johann Peter Reithmaier; Stefan Deubert; André Somers; Wolfgang Kaiser; Sven Höfling; Andreas Löffler; Stefan Reitzenstein; G. Sęk; C. Hofmann; Martin Kamp; Alfred Forchel

doi:10.1117/12.643137

28 February 2006 Nanostructured semiconductors for optoelectronic applications

Johann Peter Reithmaier, Stefan Deubert, André Somers, Wolfgang Kaiser, Sven Höfling, Andreas Löffler, Stefan Reitzenstein, G. Sęk, C. Hofmann, Martin Kamp, Alfred Forchel

Author Affiliations +

Proceedings Volume 6127, Quantum Sensing and Nanophotonic Devices III; 61270H (2006) https://doi.org/10.1117/12.643137
Event: Integrated Optoelectronic Devices 2006, 2006, San Jose, California, United States

Abstract

A brief review is given about recent advances of our research group related to nanostructured semiconductors for optoelectronic applications. Semiconductor nanostructures were realised by mainly two techniques, i.e., direct patterning by lithography and etching as well as by utilizing self-organisation effects during epitaxial growth processes. By a few examples the progress is highlighted, e.g., 915 nm quantum-dot lasers for uncooled high power pump modules, ultra-broad bandwidth 1.55 μm quantum-dash lasers, ultra-short cavity quantum cascade lasers, and high-Q quantum dot microcavities as base elements for single photon emission.

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Johann Peter Reithmaier, Stefan Deubert, André Somers, Wolfgang Kaiser, Sven Höfling, Andreas Löffler, Stefan Reitzenstein, G. Sęk, C. Hofmann, Martin Kamp, and Alfred Forchel "Nanostructured semiconductors for optoelectronic applications", Proc. SPIE 6127, Quantum Sensing and Nanophotonic Devices III, 61270H (28 February 2006); https://doi.org/10.1117/12.643137

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