1 March 2006 Evaluation of manufacturability for 3D photonic crystal waveguide with nanoimprint
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Abstract
Currently a few hundreds nm dimension is employed to achieve visible and infrared light optical elements for optics field as nano-optics. On the other hand there are a lot of reports of nano-imprint experiment including under 50 nm for storage, bio-technology or semiconductor application. And one of the biggest advantages of nano-imprint is three dimensional fabrications at one imprint procedure. However already introduced two or three dimensional imprinted optical elements are either just confirming replication of conventional Fresnel optics or defect negligible lattice structure. Three dimensional nano-imprint mold (3D-mold) must have great potential for optics fabrication. The combination of 3D-mold and three dimensional nano-imprint method can create flexible optical behavior. Here practical fabrication trials for three dimensional photonic crystal waveguide with 3D-mold and nano-imprint technology are discussed. Particularly fabrication 3D-mold with quarts, nano-imprint methodology and waveguide structure with evaluation and simulation are focused.
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Takeya Shimomura, Takeya Shimomura, Kimio Ito, Kimio Ito, Nobuhito Toyama, Nobuhito Toyama, } "Evaluation of manufacturability for 3D photonic crystal waveguide with nanoimprint", Proc. SPIE 6128, Photonic Crystal Materials and Devices IV, 61281O (1 March 2006); doi: 10.1117/12.645712; https://doi.org/10.1117/12.645712
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