9 June 2006 PVD SiC and PVD Si coatings on RB SiC for surface modification
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Proceedings Volume 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 61490A (2006) https://doi.org/10.1117/12.674197
Event: 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2005, Xian, China
Abstract
Recently, RB SiC as a two-phase mirror material has taken particularly attraction because of its readily formable to near-net-shape. But it is difficult to obtain high quality optical surface due to the polish rate differences between SiC and Si components. Typical defects, such as polishing scratches, pores and surface irregularities which are mostly caused by the inhomogeneity of SiC and Si phase distributions are easily detected. The solution is the addition of a thick coating to cover these surface defects which may be polished to improve the quality of optical surface. Two thick coatings, PVD Si and PVD SiC, were applied by RF magnetron sputtering in this paper. After a series of sputtering parameters optimization, both the coatings' surfaces show fewer defects than that of RB SiC after polished. Results from this PVD progress, the surface morphologies' changes in optimization and the surface defects after polished are presented.
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Huidong Tang, Zhengren Huang, Shouhong Tan, "PVD SiC and PVD Si coatings on RB SiC for surface modification", Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 61490A (9 June 2006); doi: 10.1117/12.674197; https://doi.org/10.1117/12.674197
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