9 June 2006 Fabrication of relief gratings on high photosensitive SiO2/ZrO2 gel film by UV exposure
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Proceedings Volume 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 61490N (2006) https://doi.org/10.1117/12.674210
Event: 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2005, Xian, China
Abstract
SiO2/ZrO2 gel films were derived from Zr-butoxide modified chemically with β-diketones and then mixed with Tetraethyl orthosilicate via Sol-Gel process. The obtained gel films showed an absorption band, in characteristic of the π-&pi* transition of chelate ring at around 334 nm, and its refractive index was changed from 1.463~1.647. The Si-O-Zr, Zr-O bands were detected by FTIR. The result indicated that SiO2 and ZrO2 integrated uniformly in the films on micro molecule magnitude. The negative tone gel films were irradiated with high pressure mercury lamp through mask and then leached in ethyl alcohol. The above process gave uniform surface-relief gratings of periods at 2.0μm. The present study had proved that the photosensitive gel films were versatile for the fabrication of micro optical devices
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Xiang Xu, Xiang Xu, Bin Zhou, Bin Zhou, Chunze Liu, Chunze Liu, Chao Xu, Chao Xu, Guangming Wu, Guangming Wu, Xingyuan Ni, Xingyuan Ni, Jun Shen, Jun Shen, } "Fabrication of relief gratings on high photosensitive SiO2/ZrO2 gel film by UV exposure", Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 61490N (9 June 2006); doi: 10.1117/12.674210; https://doi.org/10.1117/12.674210
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