Paper
9 June 2006 Optical properties of SiO2/Si3N4 films prepared on sapphire
Liping Feng, Zhengtang Liu, Qiang Li, QinQin Lu
Author Affiliations +
Proceedings Volume 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 61491I (2006) https://doi.org/10.1117/12.674242
Event: 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2005, Xian, China
Abstract
Double layer films of SiO2/Si3N4 were prepared on sapphire (α-Al2O3) by radio frequency magnetron reactive sputtering in order to increase the transmission of infrared windows of sapphire. Composition and structure of each layer of the film were analyzed by X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD), respectively. The refractive index of deposited films was measured and effects of the coatings on optical properties of sapphire have been studied. Transmittance spectrum of uncoated sapphire and the sapphire coated on both sides with double layer films of SiO2/Si3N4 have been measured using a Fourier Transform Infrared (FTIR) spectrometer. The results show that the designed SiO2/Si3N4 films can increase the transmission of sapphire in mid-wave infrared greatly. The average transmittance of sapphire coated with the double layer films of SiO2/Si3N4 on both sides, at wavelengths from 3 to 4.5um, can be increased to 96.3%, 10.9% higher than uncoated sapphire sample with 85.4% in average transmittance at room temperature. What's more, sapphire uncoated and coated on both sides with double layer films of SiO2/Si3N4 were heated to 1000oC and the transmissions at high temperature were measured. The results show that the transmission of coated sapphires was higher than that of uncoated ones at high temperature. The decreases in average transmission were less than 2% for the sapphire coated with the designed double layer films at 1000oC.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Liping Feng, Zhengtang Liu, Qiang Li, and QinQin Lu "Optical properties of SiO2/Si3N4 films prepared on sapphire", Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 61491I (9 June 2006); https://doi.org/10.1117/12.674242
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KEYWORDS
Sapphire

Silicon

Refractive index

Transmittance

Oxygen

Sputter deposition

Optical properties

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