9 June 2006 Preparation of silicon coating on SiC mirror by EB-PVD
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Proceedings Volume 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 61492C (2006) https://doi.org/10.1117/12.674280
Event: 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2005, Xian, China
Abstract
Some investigations into preparation of silicon coating on SiC mirror by Electronic Beam Physical Vapor Deposition (EB-PVD) are introduced in the paper, which include adhesion strength of coating to substrate, pattern of coating, and residual stress etc. According to the investigations, it was found that only when the temperature of substrate in the optimization temperature range, the excellent thermal-shock resistance and adhesion strength of coating to substrate are obtained. Furthermore, the coating has the column crystal structure. surface finish, deposition rate and gravity direction may have important influences on properties of coating-substrate system.
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Yumin Zhang, Yufeng Zhou, Jiecai Han, Jianhan Zhang, Wang Yao, Yuanyuan Han, "Preparation of silicon coating on SiC mirror by EB-PVD", Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 61492C (9 June 2006); doi: 10.1117/12.674280; https://doi.org/10.1117/12.674280
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