9 June 2006 Study of high transmittance shield film for microwave sulfur light
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Proceedings Volume 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 61492Y (2006) https://doi.org/10.1117/12.674301
Event: 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2005, Xian, China
Abstract
The line width and period of the shield film were designed and optimized based on the principle of microwave transmission. The photolithography technology has been used to generate a photo mask. Then the mask was duplicated on the anti-refection coated fused silica substrate by adding metal and protective coatings with RF sputtering technology, followed by photoresist removing and other procedures. Finally, a high precision and dense metal shield film were developed on the substrate. A transmission of about 97% has been tested in the final result. A surface resistance of 30Ω/square has also been obtained. The microwave of 2.45GHZ has been completely shielded from radiation.
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Xinhua Fu, Xinhua Fu, Lianhe Dong, Lianhe Dong, Peng Lu, Peng Lu, Weibo Duan, Weibo Duan, Xiumin Li, Xiumin Li, } "Study of high transmittance shield film for microwave sulfur light", Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 61492Y (9 June 2006); doi: 10.1117/12.674301; https://doi.org/10.1117/12.674301
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