Photoresist spherical microlens array pattern can be fabricated by using multiple mask photoengraving and thermofusion forming process. By reactive ion beam etching, the spherical photoresist microlens array can be transferred effectively to a quartz substrate. The experimental parameters of the fused quartz microlens are the mean curvature of 40μm, mean bottom size of Φ56μm, mean apex height of 10.6μm.Scanning electron microscope (SEM) and surface contourgraph show that the pattern of spherical microlens array prepared is regular and well distributed, the configuration of each
fused quartz microlens is clear. Its surface is smooth and sleek. Experimental results show that by controlling amount of exposure according to spatial distribution, any surface structure which meets demands can be fabricated on photoresist of a certain thickness. In the process of microlens array pattern transfer by using reactive ion beam etching, etching parameters can be adjusted independently and controlled accurately. In the process, various technical processes can be schemed according to various demands, the best etching technique can be selected. In this paper, main process of microlens array fabrication is narrated. Main factors with influence on fabrication are analyzed.