Paper
22 March 2006 RIM-13: A high-resolution imaging tool for aerial image monitoring of patterned and blank EUV reticles
M. Booth, A. Brunton, J. Cashmore, P. Elbourn, G. Elliner, M. Gower, J. Greuters, J. Hirsch, L. Kling, N. McEntee, P. Richards, V. Truffert, I. Wallhead, M. Whitfield
Author Affiliations +
Abstract
Key features of the RIM-13 EUV actinic reticle imaging microscope are summarised. This is a tool which generates aerial images from blank or patterned EUV masks, emulating the illumination and projection optics of an exposure tool. Such images of mask defects, acquired by a CCD camera, are analysed using the tool software to predict their effect on resist exposure. Optical, mechanical and software performance of the tool are reported.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. Booth, A. Brunton, J. Cashmore, P. Elbourn, G. Elliner, M. Gower, J. Greuters, J. Hirsch, L. Kling, N. McEntee, P. Richards, V. Truffert, I. Wallhead, and M. Whitfield "RIM-13: A high-resolution imaging tool for aerial image monitoring of patterned and blank EUV reticles", Proc. SPIE 6151, Emerging Lithographic Technologies X, 61510B (22 March 2006); https://doi.org/10.1117/12.657556
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KEYWORDS
Reticles

Extreme ultraviolet

Microscopes

Photomasks

Extreme ultraviolet lithography

Imaging systems

Vibration isolation

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