Effect of residual gas atmosphere on lifetime of Ru-capped EUVL projection optics mirror

Yukinobu Kakutani; Masahito Niibe; Yoshio Gomei; Hiromitsu Takase; Shigeru Terashima; Shuichi Matsunari; Takashi Aoki; Katsuhiko Murakami; Yasuaki Fukuda

doi:10.1117/12.656240

23 March 2006 Effect of residual gas atmosphere on lifetime of Ru-capped EUVL projection optics mirror

Yukinobu Kakutani, Masahito Niibe, Yoshio Gomei, Hiromitsu Takase, Shigeru Terashima, Shuichi Matsunari, Takashi Aoki, Katsuhiko Murakami, Yasuaki Fukuda

Author Affiliations +

Proceedings Volume 6151, Emerging Lithographic Technologies X; 61510H (2006) https://doi.org/10.1117/12.656240
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

Reflectance changes during the EUV irradiation were in-situ measured using two different experimental systems. One system consisted of slight high hydrocarbon (HC) content chamber and the other consisted of low HC content chamber. Distribution maps of the reflectance changes were quite different from each other. Especially, the reflectance change at the center of the EUV irradiation area was suppressed when the high HC content system was used. The surface analysis using XPS was performed. According to the analysis, it was found that two reflectance changes were arising from different reasons. It would seem that the origin of the different reasons were difference of the residual gas atmosphere.

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Yukinobu Kakutani, Masahito Niibe, Yoshio Gomei, Hiromitsu Takase, Shigeru Terashima, Shuichi Matsunari, Takashi Aoki, Katsuhiko Murakami, and Yasuaki Fukuda "Effect of residual gas atmosphere on lifetime of Ru-capped EUVL projection optics mirror", Proc. SPIE 6151, Emerging Lithographic Technologies X, 61510H (23 March 2006); https://doi.org/10.1117/12.656240

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