23 March 2006 Effect of residual gas atmosphere on lifetime of Ru-capped EUVL projection optics mirror
Author Affiliations +
Abstract
Reflectance changes during the EUV irradiation were in-situ measured using two different experimental systems. One system consisted of slight high hydrocarbon (HC) content chamber and the other consisted of low HC content chamber. Distribution maps of the reflectance changes were quite different from each other. Especially, the reflectance change at the center of the EUV irradiation area was suppressed when the high HC content system was used. The surface analysis using XPS was performed. According to the analysis, it was found that two reflectance changes were arising from different reasons. It would seem that the origin of the different reasons were difference of the residual gas atmosphere.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yukinobu Kakutani, Masahito Niibe, Yoshio Gomei, Hiromitsu Takase, Shigeru Terashima, Shuichi Matsunari, Takashi Aoki, Katsuhiko Murakami, Yasuaki Fukuda, "Effect of residual gas atmosphere on lifetime of Ru-capped EUVL projection optics mirror", Proc. SPIE 6151, Emerging Lithographic Technologies X, 61510H (23 March 2006); doi: 10.1117/12.656240; https://doi.org/10.1117/12.656240
PROCEEDINGS
8 PAGES


SHARE
RELATED CONTENT


Back to Top