23 March 2006 EUV sources for the alpha-tools
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Abstract
In this paper, we report on the recent progress of the Philips Extreme UV source. The Philips source concept is based on a discharge plasma ignited in a Sn vapor plume that is ablated by a laser pulse. Using rotating electrodes covered with a regenerating tin surface, the problems of electrode erosion and power scaling are fundamentally solved. Most of the work of the past year has been dedicated to develop a lamp system which is operating very reliably and stable under full scanner remote control. Topics addressed were the development of the scanner interface, a dose control system, thermo-mechanical design, positional stability of the source, tin handling, and many more. The resulting EUV source-the Philips NovaTin(R) source-can operate at more than 10kW electrical input power and delivers 200W in-band EUV into 2π continuously. The source is very small, so nearly 100% of the EUV radiation can be collected within etendue limits. The lamp system is fully automated and can operate unattended under full scanner remote control. 500 Million shots of continuous operation without interruption have been realized, electrode lifetime is at least 2 Billion shots. Three sources are currently being prepared, two of them will be integrated into the first EUV Alpha Demonstration tools of ASML. The debris problem was reduced to a level which is well acceptable for scanner operation. First, a considerable reduction of the Sn emission of the source has been realized. The debris mitigation system is based on a two-step concept using a foil trap based stage and a chemical cleaning stage. Both steps were improved considerably. A collector lifetime of 1 Billion shots is achieved, after this operating time a cleaning would be applied. The cleaning step has been verified to work with tolerable Sn residues. From the experimental results, a total collector lifetime of more than 10 Billion shots can be expected.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joseph Pankert, Joseph Pankert, Rolf Apetz, Rolf Apetz, Klaus Bergmann, Klaus Bergmann, Marcel Damen, Marcel Damen, Günther Derra, Günther Derra, Oliver Franken, Oliver Franken, Maurice Janssen, Maurice Janssen, Jeroen Jonkers, Jeroen Jonkers, Jürgen Klein, Jürgen Klein, Helmar Kraus, Helmar Kraus, Thomas Krücken, Thomas Krücken, Andreas List, Andreas List, Micheal Loeken, Micheal Loeken, Arnaud Mader, Arnaud Mader, Christof Metzmacher, Christof Metzmacher, Willi Neff, Willi Neff, Sven Probst, Sven Probst, Ralph Prümmer, Ralph Prümmer, Oliver Rosier, Oliver Rosier, Stefan Schwabe, Stefan Schwabe, Stefan Seiwert, Stefan Seiwert, Guido Siemons, Guido Siemons, Dominik Vaudrevange, Dominik Vaudrevange, Dirk Wagemann, Dirk Wagemann, Achim Weber, Achim Weber, Oliver Zitzen, Oliver Zitzen, } "EUV sources for the alpha-tools", Proc. SPIE 6151, Emerging Lithographic Technologies X, 61510Q (23 March 2006); doi: 10.1117/12.657066; https://doi.org/10.1117/12.657066
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