Paper
23 March 2006 Design and optimization of collectors for extreme ultraviolet lithography
Fabio E. Zocchi, Enrico Buratti, Valentino Rigato
Author Affiliations +
Abstract
The design and optimization of nested grazing incidence collectors for extreme ultra-violet lithography is discussed taking into account the boundary conditions set by optical, mechanical, thermal, and manufacturing requirements. The trend of the collection efficiency as a function of numerical the aperture at the intermediate focus, the source-optics distance and the focal length is presented. The effect of the thickness of the mirrors on the optical performance and stability under thermal load is also discussed as a specific example involving optical, thermal and manufacturing issues. As an introduction to the discussion of the design and optimization of the collector, a theoretical maximum limit for the collection efficiency is studied as a function of collected solid angle and system etendue.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fabio E. Zocchi, Enrico Buratti, and Valentino Rigato "Design and optimization of collectors for extreme ultraviolet lithography", Proc. SPIE 6151, Emerging Lithographic Technologies X, 61510T (23 March 2006); https://doi.org/10.1117/12.656417
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Cited by 13 scholarly publications.
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KEYWORDS
Mirrors

Reflectivity

Optical design

Optics manufacturing

Grazing incidence

Thermography

Fiber optic illuminators

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