23 March 2006 EUV imaging with a 13nm tabletop laser reaches sub-38 nm spatial resolution
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Abstract
We have acquired images with sub-38 nm spatial resolution using a tabletop extreme ultraviolet (EUV) imaging system operating at a wavelength of 13.2 nm, which is within the bandwidth of Mo/Si lithography mirrors This zone plate-based, full-field microscope has the power to render images in only several seconds with up to a 10,000 μm2 field of view. The ability to acquire such high-resolution images using a compact EUV plasma laser source opens many possibilities for nanotechnology, including in-house actinic inspection of EUV lithography mask blanks.
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Georgiy Vaschenko, Georgiy Vaschenko, Fernando Brizuela, Fernando Brizuela, Courtney Brewer, Courtney Brewer, Miguel A. Larotonda, Miguel A. Larotonda, Yong Wang, Yong Wang, Bradley M. Luther, Bradley M. Luther, Mario C. Marconi, Mario C. Marconi, Jorge J. Rocca, Jorge J. Rocca, Carmen S. Menoni, Carmen S. Menoni, Weilun Chao, Weilun Chao, Erik H. Anderson, Erik H. Anderson, Yanwei Liu, Yanwei Liu, David T. Attwood, David T. Attwood, } "EUV imaging with a 13nm tabletop laser reaches sub-38 nm spatial resolution", Proc. SPIE 6151, Emerging Lithographic Technologies X, 61510X (23 March 2006); doi: 10.1117/12.656588; https://doi.org/10.1117/12.656588
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