24 March 2006 Study of ruthenium-capped multilayer mirror for EUV irradiation durability
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The changes of chemical state and multilayer structure of Ru capped multilayer mirrors (MLMs) by irradiation of extreme ultraviolet (EUV) from synchrotron radiation (SR) were investigated using Auger electron spectroscopy (AES). It was found that irradiation induced Si diffusion and Si oxidation. Calculation of temperature distribution showed that Si diffusion was less relevant to temperature during irradiation.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hiromitsu Takase, Hiromitsu Takase, Shigeru Terashima, Shigeru Terashima, Yoshio Gomei, Yoshio Gomei, Masayuki Tanabe, Masayuki Tanabe, Yutaka Watanabe, Yutaka Watanabe, Takashi Aoki, Takashi Aoki, Katsuhiko Murakami, Katsuhiko Murakami, Shuichi Matsunari, Shuichi Matsunari, Masahito Niibe, Masahito Niibe, Yukinobu Kakutani, Yukinobu Kakutani, } "Study of ruthenium-capped multilayer mirror for EUV irradiation durability", Proc. SPIE 6151, Emerging Lithographic Technologies X, 615135 (24 March 2006); doi: 10.1117/12.657089; https://doi.org/10.1117/12.657089

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