Fabrication of organic nanoparticles by PRINT: Master generation using lithographic and RIE techniques

Ashish A. Pandya; Benjamin W. Maynor; Stephanie E. A. Gratton; David G. Vellenga; D. Ginger Yu; Carlton M. Osburn; Joseph M. DeSimone

doi:10.1117/12.656510

24 March 2006 Fabrication of organic nanoparticles by PRINT: master generation using lithographic and RIE techniques

Ashish A. Pandya, Benjamin W. Maynor, Stephanie E. A. Gratton, David G. Vellenga, D. Ginger Yu, Carlton M. Osburn, Joseph M. DeSimone

Author Affiliations +

Proceedings Volume 6151, Emerging Lithographic Technologies X; 61513C (2006) https://doi.org/10.1117/12.656510
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

By using PRINT (Particle Replication In Non-wetting Templates), a general soft technique for replication of diverse shapes at the sub-micron level, we have been able to produce organic nano-particles. Lithographic patterning (using 193nm exposure tool) was employed to generate 160nm posts on a 6" Si wafer; the material of the posts being the organic polymer based commercial photoresist. RIE was then performed on the patterned substrate to transfer the geometry to the Si; various aspect ratios of the Si nano-posts were obtained upon etch time variation. PRINT was used to make a mold of the nano-features on the Si wafer and subsequently fabricate cross-linked organic nano-particles by using PEG-diacrylate (PolyEthylene Glycol diacrylate). Such organic nano-matrices would be potentially useful as therapeutic agent carriers, imaging chemical encapsulants and localized drug delivery vehicles.

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Ashish A. Pandya, Benjamin W. Maynor, Stephanie E. A. Gratton, David G. Vellenga, D. Ginger Yu, Carlton M. Osburn, and Joseph M. DeSimone "Fabrication of organic nanoparticles by PRINT: master generation using lithographic and RIE techniques", Proc. SPIE 6151, Emerging Lithographic Technologies X, 61513C (24 March 2006); https://doi.org/10.1117/12.656510

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