EUV source collector

Norbert R. Böwering; Alex I. Ershov; William F. Marx; Oleh V. Khodykin; Björn A. M. Hansson; Ernesto Vargas L.; Juan A Chavez; Igor V. Fomenkov; David W. Myers; David C. Brandt

doi:10.1117/12.656462

24 March 2006 EUV source collector

Norbert R. Böwering, Alex I. Ershov, William F. Marx, Oleh V. Khodykin, Björn A. M. Hansson, Ernesto Vargas L., Juan A Chavez, Igor V. Fomenkov, David W. Myers, David C. Brandt

Author Affiliations +

Proceedings Volume 6151, Emerging Lithographic Technologies X; 61513R (2006) https://doi.org/10.1117/12.656462
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

A collector subsystem has been designed, built, and tested. The subsystem consists of a 320mm diameter ellipsoidal collector coated with a graded multilayer, mounting mechanics, thermal management capability, and a collector protection system. The EUV light emission can be collected with a solid angle of 1.6 sr. Collector substrates have been developed with the goal of offering both optical surface quality to support high multilayer mirror (MLM) reflectivity and material compatibility for long-term operation in the EUV source system. An interface-engineered MLM coating capable of maintaining high normal-incidence peak reflectivity at 13.5 nm during continuous operation at 400 °C has been developed. The thermal management of the system has been engineered and tested to maintain uniform substrate temperature during operation. Lastly, protection techniques have been developed to provide the collector with a long operational lifetime. Performance data for the entire subsystem are presented. The collector was installed in the source chamber of a laser-produced-plasma EUV source during system integration experiments using a tin droplet target. First results of the collected EUV output at the intermediate focus measured with a power meter and a fluorescence-converter-based imaging system are discussed.

Citation Download Citation

Norbert R. Böwering, Alex I. Ershov, William F. Marx, Oleh V. Khodykin, Björn A. M. Hansson, Ernesto Vargas L., Juan A Chavez, Igor V. Fomenkov, David W. Myers, and David C. Brandt "EUV source collector", Proc. SPIE 6151, Emerging Lithographic Technologies X, 61513R (24 March 2006); https://doi.org/10.1117/12.656462

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available