24 March 2006 Development of Xe- and Sn-fueled high-power Z-pinch EUV source aiming at HVM
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Discharge-produced plasma (DPP) based EUV source is being developed at Gotenba Branch of EUVA Hiratsuka R&D Center. Among the several kinds of discharge scheme, Z-pinch is employed in our source. An all-solid-state magnetic pulse compression (MPC) generator is used to create a Z-pinch plasma. Low inductance MPC generator is capable of producing a pulsed current with over 50 kA of peak amplitude and about 100 ns of pulse duration at 7 kHz of pulse repetition frequency. In order to obtain sufficient output radiation power, tin-containing gas is being used as well as xenon. Due to the high spectral efficiency of tin, demonstrated EUV output power reached 645 W/2πsr within 2% bandwidth around 13.5 nm. A novel scheme of fuel gas supply led to as good output energy stability as xenon can achieve. Using a nested grazing-incidence collector, EUV power at intermediate focus point which is defined as an interface to the exposure tool reached 42 W with 3.3 mm2sr of etendue.
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Yusuke Teramoto, Yusuke Teramoto, Gohta Niimi, Gohta Niimi, Daiki Yamatani, Daiki Yamatani, Yuki Joshima, Yuki Joshima, Kazunori Bessho, Kazunori Bessho, Takahiro Shirai, Takahiro Shirai, Tetsu Takemura, Tetsu Takemura, Toshio Yokota, Toshio Yokota, Hironobu Yabuta, Hironobu Yabuta, Khokan C. Paul, Khokan C. Paul, Kiyoyuki Kabuki, Kiyoyuki Kabuki, Koji Miyauchi, Koji Miyauchi, Mitsuru Ikeuchi, Mitsuru Ikeuchi, Kazuaki Hotta, Kazuaki Hotta, Masaki Yoshioka, Masaki Yoshioka, Hiroto Sato, Hiroto Sato, } "Development of Xe- and Sn-fueled high-power Z-pinch EUV source aiming at HVM", Proc. SPIE 6151, Emerging Lithographic Technologies X, 615147 (24 March 2006); doi: 10.1117/12.657272; https://doi.org/10.1117/12.657272


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