Automatic CD-SEM offline recipe creation for OPC qualification and process monitoring in a DRAM pilot-fab environment

Uwe Kramer; Thomas Marschner; Dieter Kaiser; Marc Winking; Christian Stief; Stefano Ventola; Dan Lewitzki; Zamir Abraham; Ovadya Menadeva; Sam Shukrun

doi:10.1117/12.654787

24 March 2006 Automatic CD-SEM offline recipe creation for OPC qualification and process monitoring in a DRAM pilot-fab environment

Uwe Kramer, Thomas Marschner, Dieter Kaiser, Marc Winking, Christian Stief, Stefano Ventola, Dan Lewitzki, Zamir Abraham, Ovadya Menadeva, Sam Shukrun

Author Affiliations +

Proceedings Volume 6152, Metrology, Inspection, and Process Control for Microlithography XX; 61520L (2006) https://doi.org/10.1117/12.654787
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

In our work we discuss two approaches of offline CD-SEM recipe creation for both OPC qualification wafers and the introduction of new products to the manufacturing line using the Applied Materials OPC Check and Offline Recipe Editor (ORE) applications. We evaluate the stability of the offline created recipes against process variations for different OPC test layouts as well as for production measurements on multiple lots per week and compare the results to the performance of recipes created directly on the tool. Further, the success rate of recipe creation is evaluated. All offline recipes have been generated in advance of wafer availability using GDS data. The offline created recipes have shown pattern recognition success rates of up to 98% and measurement success rates of up to 99% for line/space as well as for contact-hole (CH) measurements without manual assists during measurement. These success rates are in the same order of magnitude as the rates typically reached by an experienced CD-SEM engineer creating the recipes directly on the tool.

Citation Download Citation

Uwe Kramer, Thomas Marschner, Dieter Kaiser, Marc Winking, Christian Stief, Stefano Ventola, Dan Lewitzki, Zamir Abraham, Ovadya Menadeva, and Sam Shukrun "Automatic CD-SEM offline recipe creation for OPC qualification and process monitoring in a DRAM pilot-fab environment", Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61520L (24 March 2006); https://doi.org/10.1117/12.654787

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