Characterization of line edge roughness using CD-SAXS

Ronald L. Jones; Wen-li Wu; Cheng-qing Wang; Eric K. Lin; Kwang-Woo Choi; Bryan J. Rice; George M. Thompson; Steven J. Weigand; Denis T. Keane

doi:10.1117/12.656829

24 March 2006 Characterization of line edge roughness using CD SAXS

Ronald L. Jones, Wen-li Wu, Cheng-qing Wang, Eric K. Lin, Kwang-Woo Choi, Bryan J. Rice, George M. Thompson, Steven J. Weigand, Denis T. Keane

Author Affiliations +

Proceedings Volume 6152, Metrology, Inspection, and Process Control for Microlithography XX; 61520N (2006) https://doi.org/10.1117/12.656829
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

We are developing a transmission X-ray scattering platform capable of measuring the average cross section and line edge roughness in patterns ranging from 10 nm to 500 nm in width with sub-nm precision. Critical Dimension Small Angle X-ray Scattering (CD-SAXS) measures the diffraction of a collimated X-ray beam with sub-Angstrom wavelength from a repeating pattern, such as those in light scatterometry targets, to determine the pattern periodicity, line width, line height, and sidewall angle. Here, we present results from CD-SAXS with an emphasis on line edge roughness characterization. Line edge roughness measurements from CD-SAXS are compared with top-down scanning electron microscopy values and comparative definitions are discussed.

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Ronald L. Jones, Wen-li Wu, Cheng-qing Wang, Eric K. Lin, Kwang-Woo Choi, Bryan J. Rice, George M. Thompson, Steven J. Weigand, and Denis T. Keane "Characterization of line edge roughness using CD SAXS", Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61520N (24 March 2006); https://doi.org/10.1117/12.656829

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