Characterization of line edge roughness using CD-SAXS

Ronald L. Jones; Wen-li Wu; Cheng-qing Wang; Eric K. Lin; Kwang-Woo Choi; Bryan J. Rice; George M. Thompson; Steven J. Weigand; Denis T. Keane

doi:10.1117/12.656829

24 March 2006 Characterization of line edge roughness using CD SAXS

Ronald L. Jones; Wen-li Wu; Cheng-qing Wang; Eric K. Lin; Kwang-Woo Choi; Bryan J. Rice; George M. Thompson; Steven J. Weigand; Denis T. Keane

Author Affiliations +

Proceedings Volume 6152, Metrology, Inspection, and Process Control for Microlithography XX; 61520N (2006) https://doi.org/10.1117/12.656829
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

We are developing a transmission X-ray scattering platform capable of measuring the average cross section and line edge roughness in patterns ranging from 10 nm to 500 nm in width with sub-nm precision. Critical Dimension Small Angle X-ray Scattering (CD-SAXS) measures the diffraction of a collimated X-ray beam with sub-Angstrom wavelength from a repeating pattern, such as those in light scatterometry targets, to determine the pattern periodicity, line width, line height, and sidewall angle. Here, we present results from CD-SAXS with an emphasis on line edge roughness characterization. Line edge roughness measurements from CD-SAXS are compared with top-down scanning electron microscopy values and comparative definitions are discussed.

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Ronald L. Jones, Ronald L. Jones, Wen-li Wu, Wen-li Wu, Cheng-qing Wang, Cheng-qing Wang, Eric K. Lin, Eric K. Lin, Kwang-Woo Choi, Kwang-Woo Choi, Bryan J. Rice, Bryan J. Rice, George M. Thompson, George M. Thompson, Steven J. Weigand, Steven J. Weigand, Denis T. Keane, Denis T. Keane, } "Characterization of line edge roughness using CD SAXS", Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61520N (24 March 2006); doi: 10.1117/12.656829; https://doi.org/10.1117/12.656829

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