Carbon nanotube probes for three-dimensional critical-dimension metrology

B. C. Park; S. J. Ahn; J. Choi; K. Y. Jung; W. Y. Song

doi:10.1117/12.656212

24 March 2006 Carbon nanotube probes for three-dimensional critical-dimension metrology

B. C. Park, S. J. Ahn, J. Choi, K. Y. Jung, W. Y. Song

Proceedings Volume 6152, Metrology, Inspection, and Process Control for Microlithography XX; 61520R (2006) https://doi.org/10.1117/12.656212
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

We fabricate three kinds of carbon nanotube (CNT) probes to be employed in critical dimension atomic force microscope (CD-AFM). Despite unique advantages in its size and hardness, use of nanotube tip has been limited due to the lack of reproducible control of CNT orientation and its shape. We proposed that CNT alignment issues can be addressed based on the ion beam bending process, where a CNT free-standing on the apex of an AFM tip aligns itself in parallel to the FIB direction so that its free end is directed toward the ion source, with no external electric or magnetic field involved. The process allowed us to embody cylindrical probes of CNT diameters, and subsequently two additional types of CNT tips. One is ball-ended CNT tip which has, at the end of CNT tip, side-protrusions of tungsten/amorphous carbon in the horizontal dithering direction. The other is 'bent' CNT tip where the end of CNT is bent to a side direction. Using the former type of CNT tip, both sides of trench/line sidewall can be measured except for bottom corners, while the corners can be reached with the latter type, but the only one sidewall can be measured at a tip setting. The three types of tips appear to satisfy the requirements in both the size and accessibility to the re-entrant sidewall, and are awaiting actual test in CD-AFM.

Citation Download Citation

B. C. Park, S. J. Ahn, J. Choi, K. Y. Jung, and W. Y. Song "Carbon nanotube probes for three-dimensional critical-dimension metrology", Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61520R (24 March 2006); https://doi.org/10.1117/12.656212

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