24 March 2006 Long-range nanopositioning and nanomeasuring machine for application to micro- and nanotechnology
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Abstract
The paper describes the operation of a high-precision long range three-dimensional nanopositioning and nanomeasuring machine (NPM-Machine). The NPM-Machine has been developed by the Institute of Process Measurement and Sensor Technology of the Technische Universität Ilmenau. The machine was successfully tested and continually improved in the last few years. The machines are operating successfully in several German and foreign research institutes including the Physikalisch-Technische Bundesanstalt (PTB). Three plane mirror miniature interferometers are installed into the NPM-machine having a resolution of less than 0,1 nm over the entire positioning and measuring range of 25 mm x 25 mm x 5 mm. An Abbe offset-free design of the three miniature plane mirror interferometers and applying a new concept for compensating systematic errors resulting from mechanical guide systems provide extraordinary accuracy with an expanded uncertainty of only 5 - 10 nm. The integration of several, optical and tactile probe systems and nanotools makes the NPM-Machine suitable for various tasks, such as large-area scanning probe microscopy, mask and wafer inspection, nanostructuring, biotechnology and genetic engineering as well as measuring mechanical precision workpieces, precision treatment and for engineering new material. Various developed probe systems have been integrated into the NPM-Machine. The measurement results of a focus sensor, metrological AFM, white light sensor, tactile stylus probe and of a 3D-micro-touch-probe are presented. Single beam-, double beam- and triple beam interferometers built in the NPM-Machine for six degrees of freedom measurements are described.
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Gerd Jäger, Tino Hausotte, Hans-Joachim Büchner, Eberhard Manske, Ingomar Schmidt, Rostyslav Mastylo, "Long-range nanopositioning and nanomeasuring machine for application to micro- and nanotechnology", Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 615224 (24 March 2006); doi: 10.1117/12.655156; https://doi.org/10.1117/12.655156
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