24 March 2006 New measuring technique of complex index of immersion liquids
Author Affiliations +
Abstract
The next nodes in immersion lithography will require to use the 193 nm laser line with very large numerical aperture and a liquid between the optics and the resist1. Immersion lithography at 193 nm requests very specific parameters for the fluid. The first generation will use the De-Ionized Water (DIW) very pure and not recycled, but when a new optical material for last lens will be available with a refractive index (RI) larger than 1.85, a higher refractive index fluid can be used, enabling second and maybe third generation of immersion lithography at 193 nm. So the 45 and maybe the 32 nm nodes could be covered with this High Index Fluids (HIF).
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jean-Louis Stehlé, Jean-Philippe Piel, Jose Campillo-Carreto, "New measuring technique of complex index of immersion liquids", Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 615233 (24 March 2006); doi: 10.1117/12.657410; https://doi.org/10.1117/12.657410
PROCEEDINGS
8 PAGES


SHARE
RELATED CONTENT

Automatic laser refractometer
Proceedings of SPIE (November 04 2003)
Ocular dispersion
Proceedings of SPIE (June 18 1999)
Three-wavelength laser microrefractometer
Proceedings of SPIE (December 19 2008)

Back to Top