24 March 2006 Increased yield and tool life by reduction of DUV photo contamination using parts-per-trillion pure purge gases
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Abstract
This paper describes some of the results collected during the study of improved purification materials, qualification of regenerability performances and newly developed ways to detect Acids, Bases and Siloxanes at the sub-ppt levels. Removal validation down to single ppt levels has been demonstrated for several impurities such as: NH3, SO2 and Hexamethyldisiloxane (HMDSO).
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Cristian Landoni, Marco Succi, Larry Rabellino, "Increased yield and tool life by reduction of DUV photo contamination using parts-per-trillion pure purge gases", Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61523K (24 March 2006); doi: 10.1117/12.656623; https://doi.org/10.1117/12.656623
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