The reaction mechanism of poly[4-hydroxystyrene-co-4-(1,1,1,3,3,3-hexafluoro-2-hydroxypropyl)-styrene]

Hiroki Yamamoto; Takahiro Kozawa; Kazumasa Okamoto; Seiichi Tagawa; Tomoyuki Ando; Mitsuru Sato; Hiroji Komano

doi:10.1117/12.656262

29 March 2006 The reaction mechanism of poly[4-hydroxystyrene-co-4-(1,1,1,3,3,3-hexafluoro-2-hydroxypropyl)-styrene]

Hiroki Yamamoto, Takahiro Kozawa, Kazumasa Okamoto, Seiichi Tagawa, Tomoyuki Ando, Mitsuru Sato, Hiroji Komano

Proceedings Volume 6153, Advances in Resist Technology and Processing XXIII; 61533O (2006) https://doi.org/10.1117/12.656262
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

It is a well-known strategy for the improvement of resist performance to halogenate resist materials especially in electron beam and X-ray resists. However, the halogenation of polymers requires special caution for chemically amplified resists, because it may interfere with acid generation. In this work, the acid generation in poly[4-hydroxystyrene-co-4-(1,1,1,3,3,3-hexafluoro-2-hydroxypropyl)-styrene] films was investigated. Acid yields decrease as the ratio of hexafluoroalcohol units increases. This study showed that the reactivity of the polymers with low energy electrons (~0eV) correlates to the decrease of acid yields.

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Hiroki Yamamoto, Takahiro Kozawa, Kazumasa Okamoto, Seiichi Tagawa, Tomoyuki Ando, Mitsuru Sato, and Hiroji Komano "The reaction mechanism of poly[4-hydroxystyrene-co-4-(1,1,1,3,3,3-hexafluoro-2-hydroxypropyl)-styrene]", Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 61533O (29 March 2006); https://doi.org/10.1117/12.656262

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