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From optical proximity correction to lithography-driven physical design (1996-2006): 10 years of resolution enhancement technology and the roadmap enablers for the next decade
Experimental verification of PSM polarimetry: monitoring polarization at 193nm high-NA with phase shift masks
Validity of the Hopkins approximation in simulations of hyper-NA (NA>1) line-space structures for an attenuated PSM mask
(Lens) design for (chip) manufacture: lens tolerancing based on linewidth calculations in hyper-NA, immersion lithography systems
Experimental characterization of the receding meniscus under conditions associated with immersion lithography
Experimental evaluation of bull's-eye illumination for assist-free random contact printing at sub-65nm node
Compensation of high-NA mask topography effects by using object modified Kirchhoff model for 65 and 45nm nodes