15 March 2006 Polarization aberration analysis in optical lithography systems
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The use of immersion technology extends the lifetime of optical lithography by enabling ultra-high NA much greater than 1.0. Ultra-high NA application for low k1 imaging strongly demands an adoption of polarization illumination as a resolution enhancement technology. It is typically assumed that the transmitted wavefront has uniform amplitude and a constant polarization state across the pupil. This assumption is not valid any more for the level required for low k1 imaging. This paper considers methods of polarization analysis including polarization aberration theory. Definitions of basic polarization phenomena and review of matrix representation are included in this discussion. Finally we propose Pauli spin matrix representation as preferred method to describe polarization aberration.
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Jongwook Kye, Jongwook Kye, Gregory McIntyre, Gregory McIntyre, Yamamoto Norihiro, Yamamoto Norihiro, Harry J. Levinson, Harry J. Levinson, } "Polarization aberration analysis in optical lithography systems", Proc. SPIE 6154, Optical Microlithography XIX, 61540E (15 March 2006); doi: 10.1117/12.656864; https://doi.org/10.1117/12.656864

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