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15 March 2006 Second generation fluids for 193nm immersion lithography
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Abstract
Our studies of second generation immersion fluid candidates are moving beyond the discovery phase, and into addressing issues for their commercial application. Thus, we continue work to examine and fundamentally understand fluid transparency and refractive index, to fully optimize these properties. At the same time, we are now examining other process concerns, including index variation with temperature, new imaging performance studies, fluid handling considerations, and fluid property maintenance with active recycle during lithographic exposure. The systems and procedures we have developed in these areas continue to show our fluids' promise for sub-45nm immersion lithography applications.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Roger H. French, Weiming Qiu, Min K. Yang, Robert C. Wheland, Michael F. Lemon, Aaron L. Shoe, Doug J. Adelman, Michael K. Crawford, Hoang V. Tran, Jerald Feldman, Steve J. McLain, and Sheng Peng "Second generation fluids for 193nm immersion lithography", Proc. SPIE 6154, Optical Microlithography XIX, 615415 (15 March 2006); https://doi.org/10.1117/12.656626
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