15 March 2006 Immersion lithography with an ultrahigh-NA in-line catadioptric lens and a high-transmission flexible polarization illumination system
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Abstract
A second phase in the immersion era is starting with the introduction of ultra high NA (NA >1) systems. These systems are targeting for 45 nm node device production and beyond. ASML TWINSCAN XT:1700i features a maximum NA of 1.2 and a 26x33 mm2 scanner field size. The projection lens is an in-line catadioptric lens design and the AERIAL XP illumination system enables conventional an off-axis illumination pupil shapes in either polarized or un-polarized modes at maximum light efficiency. In this paper a description and a performance overview of the TWINSCAN XT:1700i is given. We will present and discuss lithographic performance results, with special attention at low-k1 imaging using high NA and polarized illumination. Overlay, focus and productivity performance will also be presented.
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Hans Jasper, Hans Jasper, Theo Modderman, Theo Modderman, Mark van de Kerkhof, Mark van de Kerkhof, Christian Wagner, Christian Wagner, Jan Mulkens, Jan Mulkens, Wim de Boeij, Wim de Boeij, Eelco van Setten, Eelco van Setten, Bernhard Kneer, Bernhard Kneer, } "Immersion lithography with an ultrahigh-NA in-line catadioptric lens and a high-transmission flexible polarization illumination system", Proc. SPIE 6154, Optical Microlithography XIX, 61541W (15 March 2006); doi: 10.1117/12.657558; https://doi.org/10.1117/12.657558
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