Translator Disclaimer
Paper
21 March 2006 Assembly of a 193-nm interferometer for immersion lithography: vibration effects on image contrast
Author Affiliations +
Abstract
This document shows the modelization of the vibration effects on a hyper NA immersion interferometer at 193 nm, and their consequences on the image contrast. Finally we propose to use a active tabletop anti vibration unit and show its benefits.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alex Lagrange, Anne Laure Charley, Olivier Lartigue, and Marianne Derouard "Assembly of a 193-nm interferometer for immersion lithography: vibration effects on image contrast", Proc. SPIE 6154, Optical Microlithography XIX, 61544O (21 March 2006); https://doi.org/10.1117/12.652227
PROCEEDINGS
5 PAGES


SHARE
Advertisement
Advertisement
Back to Top