Layout rule trends and effect upon CPU design

Clair Webb

doi:10.1117/12.664598

10 March 2006 Layout rule trends and effect upon CPU design

Clair Webb

Proceedings Volume 6156, Design and Process Integration for Microelectronic Manufacturing IV; 615602 (2006) https://doi.org/10.1117/12.664598
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

The trends in layout rules and the affect these rules have upon design are described. The slow improvement in resolution has created a need for litho-friendly design. The problems caused by LFD and the increase in number and complexity of rules are shown. Issues in implementing LFD are discussed.

Citation Download Citation

Clair Webb "Layout rule trends and effect upon CPU design", Proc. SPIE 6156, Design and Process Integration for Microelectronic Manufacturing IV, 615602 (10 March 2006); https://doi.org/10.1117/12.664598

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