10 March 2006 Layout rule trends and effect upon CPU design
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Abstract
The trends in layout rules and the affect these rules have upon design are described. The slow improvement in resolution has created a need for litho-friendly design. The problems caused by LFD and the increase in number and complexity of rules are shown. Issues in implementing LFD are discussed.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Clair Webb, "Layout rule trends and effect upon CPU design", Proc. SPIE 6156, Design and Process Integration for Microelectronic Manufacturing IV, 615602 (10 March 2006); doi: 10.1117/12.664598; https://doi.org/10.1117/12.664598
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