10 March 2006 Layout rule trends and effect upon CPU design
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Abstract
The trends in layout rules and the affect these rules have upon design are described. The slow improvement in resolution has created a need for litho-friendly design. The problems caused by LFD and the increase in number and complexity of rules are shown. Issues in implementing LFD are discussed.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Clair Webb, Clair Webb, } "Layout rule trends and effect upon CPU design", Proc. SPIE 6156, Design and Process Integration for Microelectronic Manufacturing IV, 615602 (10 March 2006); doi: 10.1117/12.664598; https://doi.org/10.1117/12.664598
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