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26 April 2006 Third optical harmonic generation at silicon surfaces structured by femtosecond laser pulses
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Proceedings Volume 6161, International Conference on Lasers, Applications, and Technologies 2005: Laser-Assisted Micro- and Nanotechnologies; 61610J (2006) https://doi.org/10.1117/12.675058
Event: International Conference on Lasers, Applications, and Technologies 2005, 2005, St. Petersburg, Russian Federation
Abstract
Silicon based microstructures with the polarization-dependent ripples were formed under femtosecond laser irradiation of (100) Si surfaces. The structures exhibit a total modification of the orientation dependence of the third optical harmonic in comparison with crystalline silicon.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. V. Zabotnov, I. A. Ostapenko, L. A. Golovan, V. Yu. Timoshenko, P. K. Kashkarov, and G. D. Shandybina "Third optical harmonic generation at silicon surfaces structured by femtosecond laser pulses", Proc. SPIE 6161, International Conference on Lasers, Applications, and Technologies 2005: Laser-Assisted Micro- and Nanotechnologies, 61610J (26 April 2006); https://doi.org/10.1117/12.675058
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