Multilayered Amorphous Silicon Photoreceptors And Their Application To Optical Printers

H. Kakinuma; S. Nishikawa; T. Watanabe; K. Nihei

doi:10.1117/12.961079

12 March 1986 Multilayered Amorphous Silicon Photoreceptors And Their Application To Optical Printers

H. Kakinuma, S. Nishikawa, T. Watanabe, K. Nihei

Proceedings Volume 0617, Amorphous Semiconductors for Microelectronics; (1986) https://doi.org/10.1117/12.961079
Event: O-E/LASE'86 Symposium, 1986, Los Angeles, CA, United States

Abstract

The preparation and properties of multilayered glow-discharge a-Si:H photoreceptors are described. It is shown that a high-rate deposition of the intrinsic layer of a Al/p/i/a-Sic structure with no stress is possible by an ordinary glow-discharge method . The composition and thickness of the blocking layers proved to affect particularly the dark decay time, residual voltage and photosensitivity. Inserting a a-Sii-xGex layer into the intrinsic layer was shown very effective in sensitizing the infrared region. A high-speed laser-beam printing system with a printing speed of 20000 lines/min for 8LPI was realized by using this sensitized photoreceptor.

Citation Download Citation

H. Kakinuma, S. Nishikawa, T. Watanabe, and K. Nihei "Multilayered Amorphous Silicon Photoreceptors And Their Application To Optical Printers", Proc. SPIE 0617, Amorphous Semiconductors for Microelectronics, (12 March 1986); https://doi.org/10.1117/12.961079

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