Paper
31 March 2006 Design and development of microstrip patch antenna at Ka-band using MEMS technology
Author Affiliations +
Abstract
This paper reports a Ka-band microstrip patch antenna fabricated using post-CMOS compatible process technology. The antenna uses an air cavity underneath the patch radiator that is supported on thin membrane. To start with, a thin dielectric film of silicon dioxide is deposited on <100> single crystal silicon substrates by RF sputtering process. The membrane is then realized using bulk micromachining technology. The antenna structure was analyzed and optimized using the finite-element method (FEM) based Ansoft High Frequency Structure Simulator software (version 9). The antenna structure mounted on a test jig with K-connector was used for testing its performance. The measured results of the fabricated prototype antenna agree quite closely with the simulated results. The fabricated antenna resonated at 36 GHz with -10 dB return loss bandwidth of 1.2 GHz. In the absence of access to well-established MEMS foundry, the RF sputtering process reported here can be advantageously used for rapid prototyping of many antenna structures.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Preeti Sharma, Shiban K. Koul, and Sudhir Chandra "Design and development of microstrip patch antenna at Ka-band using MEMS technology", Proc. SPIE 6172, Smart Structures and Materials 2006: Smart Electronics, MEMS, BioMEMS, and Nanotechnology, 61721F (31 March 2006); https://doi.org/10.1117/12.659030
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Cited by 3 scholarly publications.
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KEYWORDS
Antennas

Dielectrics

Silicon

Sputter deposition

Etching

Ka band

Microelectromechanical systems

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