27 April 2006 Fabrication technique of nanograting using AFM
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On the basis of the mechanically scratching using the Atomic Force Microscope, this paper proposes a new method for manufacturing high frequency grating. The grating was fabricated on a polycarbonate compact disc with a silicon AFM tip under the contact mode. The fabrication technique and the optimization of parameters for the technique are discussed in detail. From the experiment, the minimum spacing of the grating can reach 30 nm. The digital nano-moire patterns verify that the grating has good potential to be applied to the nano-deformation measurement.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Huimin Xie, Huimin Xie, Zhanwei Liu, Zhanwei Liu, Ming Zhang, Ming Zhang, Wei Zhang, Wei Zhang, Anand Asundi, Anand Asundi, } "Fabrication technique of nanograting using AFM", Proc. SPIE 6188, Optical Micro- and Nanometrology in Microsystems Technology, 618807 (27 April 2006); doi: 10.1117/12.663058; https://doi.org/10.1117/12.663058


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