28 April 2006 X-ray diffraction in optical microsystems technology
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Abstract
The present paper considers the use of X-Ray diffraction when applied for non destructive applications to surfaces with properties which are relevant for the qualification of the components of industrial plants or other related uses. The paper describes the most current worries related to calibration of diffractometers when they are used in laboratories; it introduces also a new approach to calculate the uncertainty of parameters related to the Bragg Equation. The approach implies to distinguish the Bragg angle from the effective angle occurring when settling a real experiment for x-ray diffraction measurements. Motivations are given for the introduction of such a new term. Moreover, based on recent networking experiences, a new conceptual approach to Round Robin test is given.
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Giovanni Berti, Giovanni Berti, } "X-ray diffraction in optical microsystems technology", Proc. SPIE 6188, Optical Micro- and Nanometrology in Microsystems Technology, 61880X (28 April 2006); doi: 10.1117/12.662498; https://doi.org/10.1117/12.662498
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