22 April 2006 Measuring system for radiation pulses from gas-puff laser-plasma source
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The paper presents a measuring system of extreme ultraviolet radiation pulses (13.5 nm). The system is used for monitoring a gas-puff laser-plasma source constructed at the Institute of Optoelectronics. The radiation source and the system are used in metrology of EUV optics. The system consists of a detection head and a system of optical filters, which are housing in a special construction. Additional element of the measuring system is a special processing unit. The measuring system was used during investigations of the plasma-laser optimization. The results were comparable with the ones from a spectrograph and an Emon energy meter.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zbigniew Bielecki, Zbigniew Bielecki, Janusz Mikołajczyk, Janusz Mikołajczyk, Rafał Rakowski, Rafał Rakowski, Jacek Wojtas, Jacek Wojtas, } "Measuring system for radiation pulses from gas-puff laser-plasma source", Proc. SPIE 6189, Optical Sensing II, 618915 (22 April 2006); doi: 10.1117/12.663240; https://doi.org/10.1117/12.663240


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