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16 May 2006 High temperature materials for resistive infrared scene projectors
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Joule heated resistive emitter arrays are presently limited to pixel temperatures on the order of 1000 K. A phase 2 SBIR program is underway to develop material sets with the goal of increasing the operating temperatures of these arrays by up to a factor of 3. Preliminary work indicates that transition metal oxides and carbides are the most promising materials for 3000 K pixel temperatures. An overview of the project and current status is presented. Thin films will be deposited by numerous vendors using a variety of techniques, and annealed at ultra-high temperatures in vacuum to select the most stable materials. Test emitter pixel arrays will be fabricated and tested.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Steven Solomon, Robert Ginn, Stephen Campbell, Maryam Jalali, and George Goldsmith "High temperature materials for resistive infrared scene projectors", Proc. SPIE 6208, Technologies for Synthetic Environments: Hardware-in-the-Loop Testing XI, 62080S (16 May 2006);

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