18 May 2006 Three-dimensional near-IR photonic crystals for optical interconnects using conventional silicon microfabrication techniques
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Proceedings Volume 6232, Intelligent Integrated Microsystems; 62320L (2006); doi: 10.1117/12.666764
Event: Defense and Security Symposium, 2006, Orlando (Kissimmee), Florida, United States
Abstract
We propose the design and fabrication of nanophotonic optical routing channels using three-dimensional photonic crystals (PhCs) operating at telecommunication wavelengths. The fabrication method involves patterning a single planar etch mask and custom-tuned isotropic reactive-ion etching with passivation to create an array of spherical voids with three-dimensional symmetry. Introducing planar defects in the buried PhC lattice can create the optical routing channels. The dispersion properties of the embedded silicon three-dimensional (3D) PhC are utilized for the optical interconnect design. The proposed design has sub-micron routing capability and flexibility with overlay and arbitrary routing. The optoelectronic circuits can be fabricated using CMOS technology on the surface and the source and emitters can be flip chip bonded to emit down, through the silicon layer. The beam coupling can be done using angled mirror facets. The guiding mechanism is based on the three-dimensional self-collimation effect.
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Bhargav S. Citla, Sriram Venkataraman, Janusz Murakowski, Shouyuan Shi, Garrett J. Schneider, Dennis W. Prather, "Three-dimensional near-IR photonic crystals for optical interconnects using conventional silicon microfabrication techniques", Proc. SPIE 6232, Intelligent Integrated Microsystems, 62320L (18 May 2006); doi: 10.1117/12.666764; https://doi.org/10.1117/12.666764
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KEYWORDS
Etching

Dispersion

Silicon

Spherical lenses

Photomasks

Photonic crystals

Optical lithography

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